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Department of Materials Science and Engineering, Kyushu Institute of Technology, 1-1 Sensui-cho, Tobata-ku, Kitakyushu 804-8550, Japan
Department of Materials Science and Engineering, Kyushu Institute of Technology, 1-1 Sensui-cho, Tobata-ku, Kitakyushu 804-8550, Japan
Department of Materials Science and Engineering, Kyushu Institute of Technology, 1-1 Sensui-cho, Tobata-ku, Kitakyushu 804-8550, Japan
Department of Materials Science and Engineering, Kyushu Institute of Technology, 1-1 Sensui-cho, Tobata-ku, Kitakyushu 804-8550, Japan
Department of Materials Science and Engineering, Kyushu Institute of Technology, 1-1 Sensui-cho, Tobata-ku, Kitakyushu 804-8550, Japan
College of Design and Manufacturing Technology, Muroran Institute of Technology, 27-1 Mizumoto-cho, Muroran, Hokkaido 050-8585, Japan
Graduate School of Integrated Science and Technology, Shizuoka University, 3-5-1 Johoku, Naka-ku, Hamamatsu 432-8561, Japan
抄録
The influence of the matching field (BΦ) on critical current density (Jc) and irreversibility temperature (Tirr) in YBa2 Cu3O7 films containing BaMO3 (M=Zr, Sn, Hf) nanorods was investigated. It was revealed that the irreversibility temperature normalized by the critical temperature (Tirr/Tc) was influenced by BΦ, for B>BΦ, but Tirr/Tc did not depend on which BaMO3 material was used for B<BΦ, i.e., there was no dependence on nanorod density, diameter, interface sharpness, or Tc in the case of ideal nanorods. However, Jc/Jc(0 T) was found to decrease with increasing BΦ at low magnetic field strengths and to improve at high magnetic field strengths. In addition to Jc being dependent on BΦ, the Tc term in Tirr and Jc(0 T) were also found to have an effect on Jc.
雑誌名
Applied Physics Letters
巻
108
号
8
ページ
082601-1 - 082601-5
発行年
2016-02-24
出版者
American Institute of Physics
ISSN
0003-6951
1077-3118
書誌レコードID
AA00543431
DOI
https://doi.org/10.1063/1.4942463
権利
Copyright (c) 2016 AIP Publishing LLC.
The following article has been submitted to/accepted by Applied Physics Letters. After it is published, it will be found at https://aip.scitation.org/journal/apl.