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Department of Materials Science and Engineering, Kyushu Institute of Technology, 1-1 Sensui-cho, Tobata-ku, Kitakyushu 804-8550, Japan
Department of Materials Science and Engineering, Kyushu Institute of Technology, 1-1 Sensui-cho, Tobata-ku, Kitakyushu 804-8550, Japan
Department of Materials Science and Engineering, Kyushu Institute of Technology, 1-1 Sensui-cho, Tobata-ku, Kitakyushu 804-8550, Japan
Graduate School of Integrated Science and Technology, Shizuoka University, 3-5-1 Johoku, Naka-ku, Hamamatsu 432-8561, Japan
Institute for Materials Research, Tohoku University, Aoba-ku, Sendai 980-8577, Japan
Department of Materials Science and Engineering, Kyushu Institute of Technology, 1-1 Sensui-cho, Tobata-ku, Kitakyushu 804-8550, Japan
抄録
The pin size effect and mixed pinning of nanorods and matrix defects are discussed for YBa2Cu3O7-δ films containing nanorods. BaSnO3 nanorods with a diameter of 11 nm and BaHfO3 nanorods with a diameter of 7 nm were prepared, and critical current density (Jc) and resistivity were measured in the films. When the coherence length was larger than the nanorod size at high temperatures near the critical temperature, the trapping angle and activation energy of the vortex flow depended on the nanorod diameter. At a moderate temperature of 65-77K, the pin size effect on Jc disappeared since the coherence length became smaller than the nanorod size. At a low temperature of 20K, the contribution from matrix pinning became comparable to that of nanorods in a high magnetic field due to the small coherence length. Thus, the temperature-dependent coherence length caused the pin potential situation to vary significantly, namely, the pin size effect and mixed pinning, which strongly affected vortex pinning in YBa2Cu3O7-d containing nanorods.
雑誌名
Applied Physics Letters
巻
110
号
5
ページ
052601-1 - 052601-5
発行年
2017-01-31
出版者
American Institute of Physics
ISSN
0003-6951
1077-3118
書誌レコードID
AA00543431
DOI
https://doi.org/10.1063/1.4975300
権利
Copyright (c) 2017 Author(s).
The following article has been submitted to/accepted by Applied Physics Letters. After it is published, it will be found at https://aip.scitation.org/journal/apl.