Study on Interaction Forces of Nano-particle to SiC Surface in Wet Process Manipulated by Localized Magnetic Control

Permpatdechakul, Thitipat

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局所磁場制御による SiC 表面およびナノ粒子相互作用力解析に関する研究

https://doi.org/10.18997/0002000932

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jou_k_394.pdf (14 MB)

アイテムタイプ

学位論文 = Thesis or Dissertation(1)

公開日

2024-08-28

資源タイプ

資源タイプ識別子

http://purl.org/coar/resource_type/c_db06

資源タイプ

doctoral thesis

タイトル

Study on Interaction Forces of Nano-particle to SiC Surface in Wet Process Manipulated by Localized Magnetic Control

言語

タイトル

局所磁場制御による SiC 表面およびナノ粒子相互作用力解析に関する研究

言語

eng

著者

Permpatdechakul, Thitipat

抄録

内容記述タイプ

Abstract

内容記述

Silicon carbide (SiC) material has become widely used in high-power semiconductors. Owing to its electronic properties surpassing the traditional material. However, surface finishing of SiC remains challenging to achieve an atomic surface performance with damage-free surfaces due to their extremely tough mechanical properties. Chemical Mechanical Polishing (CMP) is a surface finishing process that effectively produces atomically flat damage-free by employing an abrasive nano-particle in the chemical solution.
To improve the material removal performance of the SiC finishing process, the interaction force, a well-known Derjaguin-Landau-Verwey-Overbeek (DLVO) force, of the particle-slurry-substrate needs to be studied in situ in a wet process.
In this thesis, owing to the Brownian motion of the nano-particles, the particles are manipulated approaching the SiC surface by employing the localized magnetic field control and studying the interaction force by optical evanescent field microscopy.
In order to manipulate and measure the interaction force on the nano-particle in the wet process, the optical microscopy system was developed by consisting of two dominant parts, which are an optical microscopy system and a nano-particle manipulation system.
The optical microscopy system part is utilized to experimentally observe the manipulating phenomenon and measure the interaction force on a sample surface by applying evanescent field microscopy. The nano-particle manipulation system is used for pulling the particle approaching the surface by the magnetic field generated by a coil.
Firstly, to verify the manipulability of the particle approaching the SiC surface, iron oxide (Fe3O4) particles with a diameter size of range 50-100 nm dispersed in a slurry adjusted by KOH (pH 10) were employed. The coil was installed under the SiC substrate to generate the pulling magnetic field. The approaching particles to the surface were experimentally observed in situ in the wet process by the developed experimentation system.
Two example particles were able to be observed through their scattering light intensity, which relates to the magnetic field generating sequence wherein the particles were magnetically manipulated to approach close to and held at some height above the SiC surface in Z-direction with 17 mT of magnetic field control approximately.
During the particles pulled to the surface, the particles were tracked the movement in the X-Y directions during the approach to the surface. The Brownian motion ranges of the particles decreased when the particle approached close to the surface which would be limited by the interaction force.
Next, to measure this interaction force, the optical microscopy system was developed by applying the multi-wavelength evanescent fields. The height Z of the approaching particle to the surface was experimentally measured and used to calculate the interaction force at that stable height Z. Owing to the crystal structure of SiC affecting the low image contrast observation, the φ50-100 nm-sized Fe3O4 particles slurry was also employed to manipulate and measure on a silica glass substrate surface because it is higher observed image contrast and zeta potential is also similar to the SiC in an alkane solution.
The particles were magnetically pulled approach close to and held on the surface at the height Z of approximately 20 – 30 nm by the pulling magnetic field value of 40 mT approximately. At this height Z, the interaction force would be 1.4 – 5.4 pN approximately depending on the particle size and the uncertainty of height Z measurement, which summation of the interaction force and the external magnetic force should be equal to 0 N (at Σ𝐹 ⃑ (𝑧) = 0 N). To determine the minimum requirement of the external force for contacting the particle on the surface being finished, numerical simulation was employed to model the relationship between the Brownian motion of the particle and the interaction force.
The required minimum external force (𝐹 ⃑minex) for contacting particles on the surface is related to the particle size by φ2, namely 𝐹 ⃑mixex ∝ φ2. The magnetic field is inversely proportional to the particle size, namely 𝐵Z ⃑ [mT] ∝ φ-1[nm-1].
The outcome of this study would be able to be applied to estimate interaction forces on various hard materials, such as diamond, gallium nitride (GaN), etc., to determine the required minimum external force to improve the material removal performance in traditional finishing processes.
Moreover, this proposed measurement method should be a novel surface interaction measurement method, such as zeta potential, for surface science in the future.

内容記述タイプ

TableOfContents

内容記述

1 Introduction| 2 Fundamental theory| 3 Nano-particle movement on a 4H-SiC surface without magnetic field| 4 Development of localized remote magnetic control experimentation system| 5 Manipulability of magnetic nano-particles with localized magnetic field| 6 Action forces on buoyant nano-particle on surface measurement| 7 Conclusion

備考

内容記述タイプ

Other

内容記述

九州工業大学博士学位論文学位記番号: 情工博甲第394号学位授与年月日:令和6年3月25日

学位授与番号

甲第394号

学位名

博士（情報工学）

学位授与年月日

2024-03-25

学位授与機関

学位授与機関識別子Scheme

kakenhi

学位授与機関識別子

17104

学位授与機関名

九州工業大学

言語

学位授与年度

内容記述タイプ

Other

内容記述

令和5年度

出版タイプ

VoR

出版タイプResource

http://purl.org/coar/version/c_970fb48d4fbd8a85

アクセス権

open access

アクセス権URI

http://purl.org/coar/access_right/c_abf2

ID登録

10.18997/0002000932

ID登録タイプ

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局所磁場制御による SiC 表面およびナノ粒子相互作用力解析に関する研究

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