{"created":"2023-05-15T11:57:01.850546+00:00","id":2486,"links":{},"metadata":{"_buckets":{"deposit":"f9d5ba59-6d66-4a82-a514-7e58912a7344"},"_deposit":{"created_by":14,"id":"2486","owners":[14],"pid":{"revision_id":0,"type":"depid","value":"2486"},"status":"published"},"_oai":{"id":"oai:kyutech.repo.nii.ac.jp:00002486","sets":["8:9"]},"author_link":["8859","8860","679","673"],"item_1689815586683":{"attribute_name":"CRID","attribute_value_mlt":[{"subitem_relation_type":"isIdenticalTo","subitem_relation_type_id":{"subitem_relation_type_id_text":"https://cir.nii.ac.jp/crid/1390001204477393024","subitem_relation_type_select":"URI"}}]},"item_21_biblio_info_6":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2006-11-25","bibliographicIssueDateType":"Issued"},"bibliographicIssueNumber":"723","bibliographicPageEnd":"1798","bibliographicPageStart":"1793","bibliographicVolumeNumber":"72","bibliographic_titles":[{"bibliographic_title":"日本機械学會論文集. A編","bibliographic_titleLang":"ja"},{"bibliographic_title":"Transactions of the Japan Society of Mechanical Engineers. A","bibliographic_titleLang":"en"}]}]},"item_21_description_4":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"n-type bismuth-telluride thin films are fabricated by flash evaporation method. Effects of hydrogen annealing on the thin films are investigated for potential application in micro thermoelectric devices. The thin films are grown up to 1 μm on a glass substrate by flash evaporation method. The hydrogen annealing is carried out in the temperature range between 200-350℃ on an atmospheric pressure. The electrical resistivity and Seebeck coefficient are measured at room temperature. Both the electrical resistivity and Seebeck coefficient are improved by the treatment of hydrogen annealing, then the power factor of the n-type bismuth-telluride thin film reaches 8.8μW・cm^<-1>・K^2 at annealing temperature of 350℃. The structure of the thin films, which is composition and crystallinity, is studied by electron probe micro analyzer and X-ray diffraction pattern, respectively. The composition of bismuth-telluride thin films is relativity constant until higher annealing temperature. The X-ray diffraction patterns indicate that the crystallinity of the thin films is improved as higher annealing temperature.","subitem_description_language":"en","subitem_description_type":"Abstract"}]},"item_21_publisher_7":{"attribute_name":"出版社","attribute_value_mlt":[{"subitem_publisher":"日本機械学会","subitem_publisher_language":"ja"}]},"item_21_relation_12":{"attribute_name":"DOI","attribute_value_mlt":[{"subitem_relation_type":"isIdenticalTo","subitem_relation_type_id":{"subitem_relation_type_id_text":"https://doi.org/10.1299/kikaia.72.1793","subitem_relation_type_select":"DOI"}}]},"item_21_rights_13":{"attribute_name":"著作権関連情報","attribute_value_mlt":[{"subitem_rights":"社団法人日本機械学会. 本文データは学協会の許諾に基づきCiNiiから複製したものである"}]},"item_21_select_59":{"attribute_name":"査読の有無","attribute_value_mlt":[{"subitem_select_item":"yes"}]},"item_21_source_id_10":{"attribute_name":"NCID","attribute_value_mlt":[{"subitem_source_identifier":"AN0018742X","subitem_source_identifier_type":"NCID"}]},"item_21_source_id_8":{"attribute_name":"ISSN","attribute_value_mlt":[{"subitem_source_identifier":"1884-8338","subitem_source_identifier_type":"EISSN"},{"subitem_source_identifier":"0387-5008","subitem_source_identifier_type":"PISSN"}]},"item_21_text_64":{"attribute_name":"業績ID","attribute_value_mlt":[{"subitem_text_value":"7E7EB5396E789A8C492576700021D31E"}]},"item_21_version_type_58":{"attribute_name":"出版タイプ","attribute_value_mlt":[{"subitem_version_resource":"http://purl.org/coar/version/c_970fb48d4fbd8a85","subitem_version_type":"VoR"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"高尻, 雅之","creatorNameLang":"ja"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"白川, 寿照","creatorNameLang":"ja"}],"nameIdentifiers":[{}]},{"creatorAffiliations":[{"affiliationNames":[{}]}],"creatorNames":[{"creatorName":"Miyazaki, Koji","creatorNameLang":"en"},{"creatorName":"宮崎, 康次","creatorNameLang":"ja"},{"creatorName":"ミヤザキ, コウジ","creatorNameLang":"ja-Kana"}],"familyNames":[{},{},{}],"givenNames":[{},{},{}],"nameIdentifiers":[{},{},{},{},{}]},{"creatorAffiliations":[{"affiliationNames":[{}]}],"creatorNames":[{"creatorName":"Tsukamoto, Hiroshi","creatorNameLang":"en"},{"creatorName":"塚本, 寛","creatorNameLang":"ja"},{"creatorName":"ツカモト, ヒロシ","creatorNameLang":"ja-Kana"}],"familyNames":[{},{},{}],"givenNames":[{},{},{}],"nameIdentifiers":[{},{}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2010-01-15"}],"displaytype":"detail","filename":"110004997349.pdf","filesize":[{"value":"828.9 kB"}],"format":"application/pdf","licensetype":"license_note","mimetype":"application/pdf","url":{"label":"110004997349.pdf","url":"https://kyutech.repo.nii.ac.jp/record/2486/files/110004997349.pdf"},"version_id":"fdcf31b5-8e5a-4460-ba98-570d14548661"}]},"item_keyword":{"attribute_name":"キーワード","attribute_value_mlt":[{"subitem_subject":"Flash Evaporation Method","subitem_subject_scheme":"Other"},{"subitem_subject":"Thermoelectrics","subitem_subject_scheme":"Other"},{"subitem_subject":"Seebeck Effect","subitem_subject_scheme":"Other"},{"subitem_subject":"Peltier Effect","subitem_subject_scheme":"Other"},{"subitem_subject":"Hydrogen Annealing","subitem_subject_scheme":"Other"},{"subitem_subject":"Bismuth-Telluride Thin Film","subitem_subject_scheme":"Other"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"jpn"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"journal article","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_title":"フラッシュ蒸着法によるn形ビスマステルライド系薄膜の生成","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"フラッシュ蒸着法によるn形ビスマステルライド系薄膜の生成","subitem_title_language":"ja"},{"subitem_title":"Fabrication of n-type Bismuth-Telluride Thin Films by Flash Evaporation Method","subitem_title_language":"en"}]},"item_type_id":"21","owner":"14","path":["9"],"pubdate":{"attribute_name":"PubDate","attribute_value":"2010-01-15"},"publish_date":"2010-01-15","publish_status":"0","recid":"2486","relation_version_is_last":true,"title":["フラッシュ蒸着法によるn形ビスマステルライド系薄膜の生成"],"weko_creator_id":"14","weko_shared_id":-1},"updated":"2024-04-02T08:43:23.833657+00:00"}