@article{oai:kyutech.repo.nii.ac.jp:00007291,
 author = {Kataoka,  Noriyuki and Tanaka, Masashi and 田中, 将嗣 and Hosoda,  Wataru and Taniguchi,  Takumi and Fujimori,  Shin-ichi and Wakita,  Takanori and Muraoka,  Yuji and Yokoya,  Takayoshi},
 issue = {3},
 journal = {Journal of Physics: Condensed Matter},
 month = {Oct},
 note = {We have performed soft x-ray spectroscopy in order to study the photoirradiation time dependence of the valence band structure and chemical states of layered transition metal nitride chloride TiNCl. Under the soft x-ray irradiation, the intensities of the states near the Fermi level (EF) and the Ti3+ component increased, while the Cl 2p intensity decreased. Ti 2p–3d resonance photoemission spectroscopy confirmed a distinctive Fermi edge with Ti 3d character. These results indicate the photo-induced metallization originates from deintercalation due to Cl desorption, and thus provide a new carrier doping method that controls the conducting properties of TiNCl.},
 title = {Soft x-ray irradiation induced metallization of layered TiNCl},
 volume = {33},
 year = {2020},
 yomi = {タナカ, マサシ}
}