@article{oai:kyutech.repo.nii.ac.jp:00000845,
 author = {Nagayama, Katsuya and 永山, 勝也 and Kimura, Keiichi and 木村, 景一 and 森下, 浩文 and Morishita, Hirofumi and Tanaka, Kazuhiro and 田中, 和博},
 issue = {733},
 journal = {日本機械学會論文集. B編, Transactions of the Japan Society of Mechanical Engineers. B},
 month = {Sep},
 note = {In recent years, CMP (Chemical and Mechanical Polishing) greatly has taken its role as technology of planarizations to produce multi-level inter-connections. While slurry is flowing on a polishing pad in CMP, the polishing pad is in contact with the wafer to polish the wafer surface. Grooves are expected to supply slurry evenly, and to remove wasted particles. Our study aims at developing the design of the best patterns of grooves. By predicting slurry flows between wafers and polishing pads in CMP using CFD, the influence of the slurry flow by the grooved pad can be analyzed. In this paper simulations were carried out for cases without groove, with circular grooves and radial grooves. With analysis of the flow field, how grooves affect the velocity distributions are studied. We also simulated the replacement of old slurry to new slurry, and the roles of the grooves are discussed.},
 pages = {1806--1812},
 title = {CMPにおけるウエハとパッドすきま内スラリー流れの数値解析 : 溝なし,同心円溝,放射状溝での比較（流体工学,流体機械）},
 volume = {73},
 year = {2007},
 yomi = {ナガヤマ, カツヤ and キムラ, ケンイチ and タナカ, カズヒロ}
}