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Measurement of effective wetting area at hydrophobic solid–liquid interface
http://hdl.handle.net/10228/00009059
http://hdl.handle.net/10228/000090593d08b6b8-fd40-4ef2-980a-7446882c4c39
| 名前 / ファイル | ライセンス | アクション |
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j.jcis.2021.01.056_manuscript.pdf (1.9 MB)
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j.jcis.2021.01.056_Supporting.pdf (1.7 MB)
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| アイテムタイプ | 学術雑誌論文 = Journal Article(1) | |||||||||||||||||||||
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| 公開日 | 2023-01-26 | |||||||||||||||||||||
| 資源タイプ | ||||||||||||||||||||||
| 資源タイプ識別子 | http://purl.org/coar/resource_type/c_6501 | |||||||||||||||||||||
| 資源タイプ | journal article | |||||||||||||||||||||
| タイトル | ||||||||||||||||||||||
| タイトル | Measurement of effective wetting area at hydrophobic solid–liquid interface | |||||||||||||||||||||
| 言語 | ||||||||||||||||||||||
| 言語 | eng | |||||||||||||||||||||
| 著者 |
Zhang, Dejian
× Zhang, Dejian× 高瀬, 聡子
WEKO
25633
× 長山, 暁子
WEKO
15351
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| 抄録 | ||||||||||||||||||||||
| 内容記述タイプ | Abstract | |||||||||||||||||||||
| 内容記述 | Hypotheses: The effective wetting area, a parameter somewhat different from the apparent contact area at solid–liquid interfaces, plays a significant role in surface wettability. However, determination of the effective wetting area for hydrophobic surfaces remains an open question. Therefore, in the present study, we developed an electrochemical impedance method to evaluate the effective wetting area at a hydrophobic solid–liquid interface. Experiments: Patterned Si surfaces were prepared using the anisotropic wet etching method, and the water contact angle and electrochemical impedance were measured experimentally. The effective wetting area at the solid–liquid interface was examined based on the wettability and impedance results. Findings: The electrochemical impedance for the patterned Si surfaces increased with increasing surface hydrophobicity, whereas the effective wetting area decreased. The intermediate wetting state (i.e. partial wetting model) was confirmed at the patterned Si surfaces, and the effective wetting area was theoretically estimated. The effective wetting area predicted from the electrochemical impedance agreed well with that predicted from the partial wetting model, thereby demonstrating the validity of the electrochemical impedance method for evaluating the effective wetting area at the hydrophobic solid–liquid interface. | |||||||||||||||||||||
| 書誌情報 |
Journal of Colloid and Interface Science 巻 591, p. 474-482, 発行日 2021-01-26 |
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| 出版社 | ||||||||||||||||||||||
| 出版者 | Elsevier | |||||||||||||||||||||
| DOI | ||||||||||||||||||||||
| 関連タイプ | isVersionOf | |||||||||||||||||||||
| 識別子タイプ | DOI | |||||||||||||||||||||
| 関連識別子 | https://doi.org/10.1016/j.jcis.2021.01.056 | |||||||||||||||||||||
| 日本十進分類法 | ||||||||||||||||||||||
| 主題Scheme | NDC | |||||||||||||||||||||
| 主題 | 464 | |||||||||||||||||||||
| ISSN | ||||||||||||||||||||||
| 収録物識別子タイプ | ISSN | |||||||||||||||||||||
| 収録物識別子 | 0021-9797 | |||||||||||||||||||||
| 著作権関連情報 | ||||||||||||||||||||||
| 権利情報 | Copyright (c) 2021 Elsevier Inc. All rights reserved. | |||||||||||||||||||||
| キーワード | ||||||||||||||||||||||
| 主題Scheme | Other | |||||||||||||||||||||
| 主題 | Effective wetting area | |||||||||||||||||||||
| キーワード | ||||||||||||||||||||||
| 主題Scheme | Other | |||||||||||||||||||||
| 主題 | Hydrophobic surface | |||||||||||||||||||||
| キーワード | ||||||||||||||||||||||
| 主題Scheme | Other | |||||||||||||||||||||
| 主題 | Contact angle | |||||||||||||||||||||
| キーワード | ||||||||||||||||||||||
| 主題Scheme | Other | |||||||||||||||||||||
| 主題 | Electrochemical impedance | |||||||||||||||||||||
| キーワード | ||||||||||||||||||||||
| 主題Scheme | Other | |||||||||||||||||||||
| 主題 | Partial wetting model | |||||||||||||||||||||
| 出版タイプ | ||||||||||||||||||||||
| 出版タイプ | AM | |||||||||||||||||||||
| 出版タイプResource | http://purl.org/coar/version/c_ab4af688f83e57aa | |||||||||||||||||||||
| 査読の有無 | ||||||||||||||||||||||
| 値 | yes | |||||||||||||||||||||
| 研究者情報 | ||||||||||||||||||||||
| URL | https://hyokadb02.jimu.kyutech.ac.jp/html/28_ja.html | |||||||||||||||||||||
| 論文ID（連携） | ||||||||||||||||||||||
| 値 | 10360740 | |||||||||||||||||||||
| 連携ID | ||||||||||||||||||||||
| 値 | 8535 | |||||||||||||||||||||
