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フラッシュ蒸着法によるn形ビスマステルライド系薄膜の生成
http://hdl.handle.net/10228/3617
http://hdl.handle.net/10228/3617a71e548c-e452-4248-91ba-0415afff5582
名前 / ファイル | ライセンス | アクション |
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110004997349.pdf (828.9 kB)
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Item type | 学術雑誌論文 = Journal Article(1) | |||||||||||
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公開日 | 2010-01-15 | |||||||||||
資源タイプ | ||||||||||||
資源タイプ識別子 | http://purl.org/coar/resource_type/c_6501 | |||||||||||
資源タイプ | journal article | |||||||||||
タイトル | ||||||||||||
言語 | ja | |||||||||||
タイトル | フラッシュ蒸着法によるn形ビスマステルライド系薄膜の生成 | |||||||||||
タイトル | ||||||||||||
言語 | en | |||||||||||
タイトル | Fabrication of n-type Bismuth-Telluride Thin Films by Flash Evaporation Method | |||||||||||
言語 | ||||||||||||
言語 | jpn | |||||||||||
著者 |
高尻, 雅之
× 高尻, 雅之× 白川, 寿照× 宮崎, 康次
WEKO
679
× 塚本, 寛 |
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抄録 | ||||||||||||
内容記述タイプ | Abstract | |||||||||||
内容記述 | n-type bismuth-telluride thin films are fabricated by flash evaporation method. Effects of hydrogen annealing on the thin films are investigated for potential application in micro thermoelectric devices. The thin films are grown up to 1 μm on a glass substrate by flash evaporation method. The hydrogen annealing is carried out in the temperature range between 200-350℃ on an atmospheric pressure. The electrical resistivity and Seebeck coefficient are measured at room temperature. Both the electrical resistivity and Seebeck coefficient are improved by the treatment of hydrogen annealing, then the power factor of the n-type bismuth-telluride thin film reaches 8.8μW・cm^<-1>・K^2 at annealing temperature of 350℃. The structure of the thin films, which is composition and crystallinity, is studied by electron probe micro analyzer and X-ray diffraction pattern, respectively. The composition of bismuth-telluride thin films is relativity constant until higher annealing temperature. The X-ray diffraction patterns indicate that the crystallinity of the thin films is improved as higher annealing temperature. | |||||||||||
言語 | en | |||||||||||
書誌情報 |
ja : 日本機械学會論文集. A編 en : Transactions of the Japan Society of Mechanical Engineers. A 巻 72, 号 723, p. 1793-1798, 発行日 2006-11-25 |
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出版社 | ||||||||||||
言語 | ja | |||||||||||
出版者 | 日本機械学会 | |||||||||||
DOI | ||||||||||||
関連タイプ | isIdenticalTo | |||||||||||
識別子タイプ | DOI | |||||||||||
関連識別子 | https://doi.org/10.1299/kikaia.72.1793 | |||||||||||
CRID | ||||||||||||
関連タイプ | isIdenticalTo | |||||||||||
識別子タイプ | URI | |||||||||||
関連識別子 | https://cir.nii.ac.jp/crid/1390001204477393024 | |||||||||||
NCID | ||||||||||||
収録物識別子タイプ | NCID | |||||||||||
収録物識別子 | AN0018742X | |||||||||||
ISSN | ||||||||||||
収録物識別子タイプ | EISSN | |||||||||||
収録物識別子 | 1884-8338 | |||||||||||
ISSN | ||||||||||||
収録物識別子タイプ | PISSN | |||||||||||
収録物識別子 | 0387-5008 | |||||||||||
著作権関連情報 | ||||||||||||
権利情報 | 社団法人日本機械学会. 本文データは学協会の許諾に基づきCiNiiから複製したものである | |||||||||||
キーワード | ||||||||||||
主題Scheme | Other | |||||||||||
主題 | Flash Evaporation Method | |||||||||||
キーワード | ||||||||||||
主題Scheme | Other | |||||||||||
主題 | Thermoelectrics | |||||||||||
キーワード | ||||||||||||
主題Scheme | Other | |||||||||||
主題 | Seebeck Effect | |||||||||||
キーワード | ||||||||||||
主題Scheme | Other | |||||||||||
主題 | Peltier Effect | |||||||||||
キーワード | ||||||||||||
主題Scheme | Other | |||||||||||
主題 | Hydrogen Annealing | |||||||||||
キーワード | ||||||||||||
主題Scheme | Other | |||||||||||
主題 | Bismuth-Telluride Thin Film | |||||||||||
出版タイプ | ||||||||||||
出版タイプ | VoR | |||||||||||
出版タイプResource | http://purl.org/coar/version/c_970fb48d4fbd8a85 | |||||||||||
査読の有無 | ||||||||||||
値 | yes | |||||||||||
業績ID | ||||||||||||
7E7EB5396E789A8C492576700021D31E |