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Explosive crystallization of sputter-deposited amorphous germanium films by irradiation with an electron beam of SEM-level energies
http://hdl.handle.net/10228/00008408
http://hdl.handle.net/10228/00008408b8dd9024-e6ad-4ecb-bacb-181022eada6f
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JAP21-AR-01739.pdf (2.3 MB)
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Item type | 学術雑誌論文 = Journal Article(1) | |||||||||||
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公開日 | 2021-07-27 | |||||||||||
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資源タイプ識別子 | http://purl.org/coar/resource_type/c_6501 | |||||||||||
資源タイプ | journal article | |||||||||||
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タイトル | Explosive crystallization of sputter-deposited amorphous germanium films by irradiation with an electron beam of SEM-level energies | |||||||||||
言語 | en | |||||||||||
言語 | ||||||||||||
言語 | eng | |||||||||||
著者 |
Nakamura, R.
× Nakamura, R.× Matsumoto, A.× 石丸, 学
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25703
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内容記述タイプ | Abstract | |||||||||||
内容記述 | The crystallization of sputter-deposited substrate-free films of amorphous germanium was induced by electron irradiation at SEM-level energies of less than 20 keV at ambient temperature using an electron probe microanalyzer. Instantaneous crystallization, referred to as explosive crystallization, occurred consistently at 2–20 keV; the threshold of electron fluxes is 1015–1016 m−2 s−1, which is five to six orders of magnitude lower than those at 100 keV reported previously. This process is expected to be advantageous in the production of polycrystalline Ge films since it is rapid, requires little energy, and results in negligible damage to the substrate. | |||||||||||
言語 | en | |||||||||||
書誌情報 |
en : Journal of Applied Physics 巻 129, 号 21, p. 215301, 発行日 2021-06-01 |
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出版者 | American Institute of Physics | |||||||||||
言語 | en | |||||||||||
DOI | ||||||||||||
関連タイプ | isVersionOf | |||||||||||
識別子タイプ | DOI | |||||||||||
関連識別子 | https://doi.org/10.1063/5.0052142 | |||||||||||
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主題Scheme | NDC | |||||||||||
主題 | 420 | |||||||||||
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収録物識別子タイプ | NCID | |||||||||||
収録物識別子 | AA00693547 | |||||||||||
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収録物識別子タイプ | PISSN | |||||||||||
収録物識別子 | 0021-8979 | |||||||||||
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収録物識別子タイプ | EISSN | |||||||||||
収録物識別子 | 1089-7550 | |||||||||||
著作権関連情報 | ||||||||||||
権利情報 | This article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing. This article appeared in Journal of Applied Physics and may be found at https://aip.scitation.org/doi/10.1063/5.0052142. | |||||||||||
出版タイプ | ||||||||||||
出版タイプ | AM | |||||||||||
出版タイプResource | http://purl.org/coar/version/c_ab4af688f83e57aa | |||||||||||
査読の有無 | ||||||||||||
値 | yes | |||||||||||
研究者情報 | ||||||||||||
表示名 | https://hyokadb02.jimu.kyutech.ac.jp/html/100000642_ja.html | |||||||||||
URL | https://hyokadb02.jimu.kyutech.ac.jp/html/100000642_ja.html | |||||||||||
論文ID(連携) | ||||||||||||
値 | 10367530 | |||||||||||
連携ID | ||||||||||||
値 | 9025 |