{"_buckets": {"deposit": "2a246f91-8074-4c35-9855-a8b2ad6585a3"}, "_deposit": {"created_by": 11, "id": "790", "owners": [11], "pid": {"revision_id": 0, "type": "depid", "value": "790"}, "status": "published"}, "_oai": {"id": "oai:kyutech.repo.nii.ac.jp:00000790", "sets": ["7"]}, "author_link": [], "item_20_date_granted_61": {"attribute_name": "学位授与年月日", "attribute_value_mlt": [{"subitem_dategranted": "2008-03-25"}]}, "item_20_degree_grantor_59": {"attribute_name": "学位授与機関", "attribute_value_mlt": [{"subitem_degreegrantor": [{"subitem_degreegrantor_name": "九州工業大学"}], "subitem_degreegrantor_identifier": [{"subitem_degreegrantor_identifier_name": "17104", "subitem_degreegrantor_identifier_scheme": "kakenhi"}]}]}, "item_20_degree_name_58": {"attribute_name": "学位名", "attribute_value_mlt": [{"subitem_degreename": "博士（工学）"}]}, "item_20_description_30": {"attribute_name": "目次", "attribute_value_mlt": [{"subitem_description": "第1章 序論||第2章 イオン化スパッタに適したマグネット構造||第3章 イオン化スパッタによるゲート酸化膜ダメージの評価||第4章 ビアバリアメタル形成用イオン化スパッタ開発||第5章 300mm基板のバリア成膜用イオン化スパッタ開発||第6章 結論||謝辞||付録 A 発光分光による電子温度算出||付録 B プラズマシミュレーション||付録 B スパッタシミュレーション||参考文献", "subitem_description_type": "Other"}]}, "item_20_description_5": {"attribute_name": "内容記述", "attribute_value_mlt": [{"subitem_description": "九州工業大学博士学位論文 学位記番号:生工博甲第72号 学位授与年月日:平成20年3月25日", "subitem_description_type": "Other"}]}, "item_20_description_60": {"attribute_name": "学位授与年度", "attribute_value_mlt": [{"subitem_description": "平成19年度", "subitem_description_type": "Other"}]}, "item_20_dissertation_number_62": {"attribute_name": "学位授与番号", "attribute_value_mlt": [{"subitem_dissertationnumber": "甲生工第72号"}]}, "item_20_identifier_registration": {"attribute_name": "ID登録", "attribute_value_mlt": [{"subitem_identifier_reg_text": "10.18997/00000784", "subitem_identifier_reg_type": "JaLC"}]}, "item_20_select_64": {"attribute_name": "査読の有無", "attribute_value_mlt": [{"subitem_select_item": "yes"}]}, "item_20_text_34": {"attribute_name": "アドバイザー", "attribute_value_mlt": [{"subitem_text_value": "早瀬, 修二"}]}, "item_20_version_type_63": {"attribute_name": "著者版フラグ", "attribute_value_mlt": [{"subitem_version_resource": "http://purl.org/coar/version/c_970fb48d4fbd8a85", "subitem_version_type": "VoR"}]}, "item_access_right": {"attribute_name": "アクセス権", "attribute_value_mlt": [{"subitem_access_right": "open access", "subitem_access_right_uri": "http://purl.org/coar/access_right/c_abf2"}]}, "item_creator": {"attribute_name": "著者", "attribute_type": "creator", "attribute_value_mlt": [{"creatorNames": [{"creatorName": "松中, 繁樹", "creatorNameLang": "ja"}]}]}, "item_files": {"attribute_name": "ファイル情報", "attribute_type": "file", "attribute_value_mlt": [{"accessrole": "open_date", "date": [{"dateType": "Available", "dateValue": "2008-09-25"}], "displaytype": "detail", "download_preview_message": "", "file_order": 0, "filename": "D-26_sei_k_72.pdf", "filesize": [{"value": "1.5 MB"}], "format": "application/pdf", "future_date_message": "", "is_thumbnail": false, "licensetype": "license_note", "mimetype": "application/pdf", "size": 1500000.0, "url": {"label": "D-26_sei_k_72.pdf", "objectType": "fulltext", "url": "https://kyutech.repo.nii.ac.jp/record/790/files/D-26_sei_k_72.pdf"}, "version_id": "787af966-5f74-4411-aa61-3eeaafaf9a15"}]}, "item_keyword": {"attribute_name": "キーワード", "attribute_value_mlt": [{"subitem_subject": "Ionized sputter", "subitem_subject_scheme": "Other"}, {"subitem_subject": "Diverging magnetic field", "subitem_subject_scheme": "Other"}, {"subitem_subject": "Bottom coverage", "subitem_subject_scheme": "Other"}, {"subitem_subject": "Barrier metal", "subitem_subject_scheme": "Other"}, {"subitem_subject": "Unbalanced magnet", "subitem_subject_scheme": "Other"}, {"subitem_subject": "Antenna MOS", "subitem_subject_scheme": "Other"}, {"subitem_subject": "Asymmetry property", "subitem_subject_scheme": "Other"}, {"subitem_subject": "Via", "subitem_subject_scheme": "Other"}]}, "item_language": {"attribute_name": "言語", "attribute_value_mlt": [{"subitem_language": "jpn"}]}, "item_resource_type": {"attribute_name": "資源タイプ", "attribute_value_mlt": [{"resourcetype": "doctoral thesis", "resourceuri": "http://purl.org/coar/resource_type/c_db06"}]}, "item_title": "イオン化スパッタ法による微細金属配線成膜に関する研究", "item_titles": {"attribute_name": "タイトル", "attribute_value_mlt": [{"subitem_title": "イオン化スパッタ法による微細金属配線成膜に関する研究", "subitem_title_language": "ja"}, {"subitem_title": "Study of fine metallic wiring using ionized sputtering", "subitem_title_language": "en"}]}, "item_type_id": "20", "owner": "11", "path": ["7"], "permalink_uri": "https://doi.org/10.18997/00000784", "pubdate": {"attribute_name": "PubDate", "attribute_value": "2008-09-25"}, "publish_date": "2008-09-25", "publish_status": "0", "recid": "790", "relation": {}, "relation_version_is_last": true, "title": ["イオン化スパッタ法による微細金属配線成膜に関する研究"], "weko_shared_id": -1}